RING, UPPER Si EXELAN

PART DETAILS

716-007136-002(U1)
RING, UPPER Si EXELAN

OEM P/N: 

716-007136-002(U1)

ESCT P/N: 

ES2099-008

PART TYPE:

2nd Source NEW

OEM: 

LAM
MORE INFO

716-007136-002(U1) ring, upper Si Exelan for Lam Research systems

High-purity silicon upper ring for plasma confinement, chamber protection, and process uniformity

The 716-007136-002(U1) RING, UPPER Si EXELAN is a critical plasma-facing silicon component used in Lam Research Exelan™ semiconductor processing systems to support plasma confinement, chamber conditioning, and process uniformity during advanced plasma etch and semiconductor manufacturing operations.

Installed in the upper chamber region, the upper silicon ring helps maintain controlled plasma characteristics while protecting adjacent chamber hardware from direct exposure to aggressive process environments. By preserving chamber geometry and supporting stable plasma distribution, the component contributes directly to repeatable process performance, contamination control, and wafer yield.

Because upper rings operate under continuous exposure to RF energy, plasma bombardment, reactive gases, and thermal cycling, they are considered consumable components that gradually wear during production. Routine inspection and replacement maintain chamber stability and maximize equipment uptime.

The ESCT equivalent part number for this component is ES2099-008, supplied as a 2nd Source NEW OEM-compatible replacement designed to meet form, fit, and functional requirements aligned with the original Lam Research component.

Functional role within Lam Research Exelan systems

The 716-007136-002(U1) functions as a critical chamber conditioning and protection component.

Core functions include:

  • Supporting plasma confinement and stability
  • Maintaining chamber geometry
  • Protecting critical chamber hardware
  • Helping control plasma distribution
  • Reducing contamination risks
  • Supporting repeatable process performance

In Lam Research Exelan systems, upper silicon rings commonly operate alongside electrodes, focus rings, edge rings, chamber liners, shields, and electrostatic chuck (ESC) assemblies.

Design and performance characteristics

Plasma confinement and control

The upper ring helps stabilize chamber operating conditions.

Key performance characteristics include:

  • Improved plasma uniformity
  • Stable plasma boundary conditions
  • Reduced process variability
  • Consistent chamber performance
  • Better process repeatability

Proper plasma control contributes directly to yield and process consistency.

High-purity silicon construction

Silicon is widely used in plasma-processing environments due to its compatibility with semiconductor manufacturing requirements.

Performance attributes may include:

  • High-purity material composition
  • Reduced contamination contribution
  • Excellent plasma-process compatibility
  • Stable performance under aggressive chemistries
  • Reliable chamber integration

Material purity is critical in advanced semiconductor fabrication.

Chamber hardware protection

The ring serves as a sacrificial wear component.

Durability characteristics may include:

  • Resistance to plasma erosion
  • Protection of expensive chamber assemblies
  • Reduced wear on surrounding hardware
  • Extended maintenance intervals
  • Support for predictable preventive maintenance programs

Protecting chamber infrastructure helps lower long-term operating costs.

Integration with related chamber hardware

The 716-007136-002(U1) may operate alongside related chamber components including:

  • Focus rings
  • Edge rings
  • Silicon electrodes
  • Chamber liners
  • Plasma shields
  • ESC assemblies
  • RF power delivery systems

Together these components support plasma control and chamber optimization.

Impact on tool performance, yield, and uptime

The 716-007136-002(U1) can directly influence chamber performance and manufacturing productivity.

Potential impacts of wear or degradation include:

  • Plasma instability
  • Chamber conditioning drift
  • Increased particle generation
  • Process non-uniformity
  • Reduced process repeatability
  • Increased maintenance frequency
  • Reduced equipment uptime

Replacing a worn upper ring can help restore chamber stability and maintain process consistency.

Common failure modes and diagnostic indicators

Plasma erosion

Continuous plasma exposure gradually wears the silicon surface.

Indicators include:

  • Surface material loss
  • Visible erosion patterns
  • Chamber performance drift
  • Reduced process consistency
  • Increased maintenance findings

Particle generation

Wear progression may affect contamination control.

Symptoms may include:

  • Increased particle counts
  • Yield-impacting defects
  • Chamber cleanliness concerns
  • Frequent maintenance requirements
  • Process variability

Dimensional wear

Long-term exposure may alter component geometry.

Indicators include:

  • Chamber qualification failures
  • Plasma confinement issues
  • Alignment concerns
  • Process repeatability problems
  • Reduced chamber stability

Failure to replace worn upper rings may accelerate degradation of adjacent plasma-facing components.

Installation and maintenance best practices

To support best performance:

  • Follow OEM-approved handling procedures
  • Inspect silicon surfaces before installation
  • Verify proper seating and alignment
  • Evaluate adjacent consumables during maintenance
  • Monitor wear progression during PM intervals
  • Perform chamber qualification after replacement
  • Confirm stable process performance before production release

OEM part number and compatibility

The 716-007136-002(U1) Ring, Upper Si Exelan is an OEM-referenced Lam Research component.

Key considerations:

  • Must match chamber architecture requirements
  • Material and dimensional compatibility are critical
  • Verify process compatibility before installation
  • Confirm integration with surrounding chamber hardware
  • Evaluate associated wear components during maintenance

Why source from ESCT Fab Support

ESCT advantages

  • OEM-aligned form, fit, and functional verification
  • Quality-controlled manufacturing and inspection processes
  • Verified subsystem compatibility support
  • Faster availability compared to OEM lead times
  • Reduced Mean Time To Repair (MTTR)
  • Expertise in semiconductor plasma-facing consumables
  • Cost-effective second-source procurement strategies

Maintaining inventory of the ES2099-008 / 716-007136-002(U1) can help reduce downtime exposure and improve maintenance readiness.

Frequently asked questions

1. What does the 716-007136-002(U1) upper Si ring do?

It helps control plasma behavior, protect chamber hardware, and maintain stable process conditions within Lam Research Exelan systems.

2. Why is an upper silicon ring important?

It supports plasma confinement, contamination control, and process repeatability while protecting critical chamber components.

3. Why is silicon used for this component?

High-purity silicon offers excellent plasma compatibility, low contamination characteristics, and stable performance in semiconductor manufacturing environments.

4. What are signs the upper ring may need replacement?

Common indicators include:

  • Surface erosion
  • Material wear
  • Increased particle counts
  • Chamber qualification failures
  • Plasma instability
  • Process drift

5. Can ring wear affect process uniformity?

Yes. Changes in component geometry can influence plasma characteristics and process consistency.

6. Can a worn ring increase contamination risk?

Yes. Surface degradation may contribute to particle generation and wafer defects.

7. Can this component affect wafer yield?

Yes. Plasma instability and contamination-related issues can directly impact process performance and yield.

8. How are upper ring issues typically diagnosed?

Problems are commonly identified through PM inspections, chamber qualification testing, particle monitoring, and visual wear assessments.

9. Does replacement require chamber qualification afterward?

Yes. Chamber qualification and process verification should always be completed following replacement.

10. What happens if the wrong ring is installed?

Incorrect dimensions or material specifications may affect plasma performance, chamber compatibility, and process outcomes.

11. Is this an original OEM Lam Research part?

No. This product is supplied as ESCT P/N ES2099-008, a 2nd Source NEW OEM-compatible replacement aligned with the original Lam Research component requirements.

12. Is compatibility verification important before ordering?

Yes. Chamber configuration, dimensions, and process requirements should always be confirmed.

13. Can ESCT verify compatibility before shipment?

Yes. ESCT supports compatibility verification based on equipment and application requirements.

14. Are related Exelan chamber consumables available as well?

Depending on availability, associated electrodes, focus rings, shields, liners, edge rings, and other plasma-facing chamber components may also be supported.

15. Why is preventive replacement recommended for upper rings?

Preventive replacement helps maintain chamber stability, reduce contamination risks, preserve process consistency, and minimize unexpected production interruptions.

Summary

The 716-007136-002(U1) Ring, Upper Si Exelan is a critical plasma-facing consumable that supports plasma confinement, chamber protection, and repeatable semiconductor manufacturing performance in Lam Research Exelan systems.

Its condition can directly influence process uniformity, contamination control, equipment uptime, and wafer yield.

Sourcing through ESCT Fab Support as ES2099-008 provides a verified 2nd Source NEW OEM-compatible replacement backed by semiconductor expertise, quality verification, and responsive supply support.

Disclaimer: This part is supplied by ESCT Fab Support as a new, OEM-compatible second-source component, verified to the form, fit and function of Lam Research part number 716-007136-002(U1). It is not an original OEM part and is not sold as one. It is not manufactured by, endorsed by, or affiliated with Lam Research, and all manufacturer names and part numbers are quoted for identification and compatibility purposes only.

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