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The 716-007136-002(U1) RING, UPPER Si EXELAN is a critical plasma-facing silicon component used in Lam Research Exelan™ semiconductor processing systems to support plasma confinement, chamber conditioning, and process uniformity during advanced plasma etch and semiconductor manufacturing operations.
Installed in the upper chamber region, the upper silicon ring helps maintain controlled plasma characteristics while protecting adjacent chamber hardware from direct exposure to aggressive process environments. By preserving chamber geometry and supporting stable plasma distribution, the component contributes directly to repeatable process performance, contamination control, and wafer yield.
Because upper rings operate under continuous exposure to RF energy, plasma bombardment, reactive gases, and thermal cycling, they are considered consumable components that gradually wear during production. Routine inspection and replacement maintain chamber stability and maximize equipment uptime.
The ESCT equivalent part number for this component is ES2099-008, supplied as a 2nd Source NEW OEM-compatible replacement designed to meet form, fit, and functional requirements aligned with the original Lam Research component.
The 716-007136-002(U1) functions as a critical chamber conditioning and protection component.
Core functions include:
In Lam Research Exelan systems, upper silicon rings commonly operate alongside electrodes, focus rings, edge rings, chamber liners, shields, and electrostatic chuck (ESC) assemblies.
The upper ring helps stabilize chamber operating conditions.
Key performance characteristics include:
Proper plasma control contributes directly to yield and process consistency.
Silicon is widely used in plasma-processing environments due to its compatibility with semiconductor manufacturing requirements.
Performance attributes may include:
Material purity is critical in advanced semiconductor fabrication.
The ring serves as a sacrificial wear component.
Durability characteristics may include:
Protecting chamber infrastructure helps lower long-term operating costs.
The 716-007136-002(U1) may operate alongside related chamber components including:
Together these components support plasma control and chamber optimization.
The 716-007136-002(U1) can directly influence chamber performance and manufacturing productivity.
Potential impacts of wear or degradation include:
Replacing a worn upper ring can help restore chamber stability and maintain process consistency.
Continuous plasma exposure gradually wears the silicon surface.
Indicators include:
Wear progression may affect contamination control.
Symptoms may include:
Long-term exposure may alter component geometry.
Indicators include:
Failure to replace worn upper rings may accelerate degradation of adjacent plasma-facing components.
To support best performance:
The 716-007136-002(U1) Ring, Upper Si Exelan is an OEM-referenced Lam Research component.
Key considerations:
Maintaining inventory of the ES2099-008 / 716-007136-002(U1) can help reduce downtime exposure and improve maintenance readiness.
It helps control plasma behavior, protect chamber hardware, and maintain stable process conditions within Lam Research Exelan systems.
It supports plasma confinement, contamination control, and process repeatability while protecting critical chamber components.
High-purity silicon offers excellent plasma compatibility, low contamination characteristics, and stable performance in semiconductor manufacturing environments.
4. What are signs the upper ring may need replacement?
Common indicators include:
Yes. Changes in component geometry can influence plasma characteristics and process consistency.
Yes. Surface degradation may contribute to particle generation and wafer defects.
Yes. Plasma instability and contamination-related issues can directly impact process performance and yield.
Problems are commonly identified through PM inspections, chamber qualification testing, particle monitoring, and visual wear assessments.
Yes. Chamber qualification and process verification should always be completed following replacement.
Incorrect dimensions or material specifications may affect plasma performance, chamber compatibility, and process outcomes.
No. This product is supplied as ESCT P/N ES2099-008, a 2nd Source NEW OEM-compatible replacement aligned with the original Lam Research component requirements.
Yes. Chamber configuration, dimensions, and process requirements should always be confirmed.
Yes. ESCT supports compatibility verification based on equipment and application requirements.
Depending on availability, associated electrodes, focus rings, shields, liners, edge rings, and other plasma-facing chamber components may also be supported.
Preventive replacement helps maintain chamber stability, reduce contamination risks, preserve process consistency, and minimize unexpected production interruptions.
The 716-007136-002(U1) Ring, Upper Si Exelan is a critical plasma-facing consumable that supports plasma confinement, chamber protection, and repeatable semiconductor manufacturing performance in Lam Research Exelan systems.
Its condition can directly influence process uniformity, contamination control, equipment uptime, and wafer yield.
Sourcing through ESCT Fab Support as ES2099-008 provides a verified 2nd Source NEW OEM-compatible replacement backed by semiconductor expertise, quality verification, and responsive supply support.
Disclaimer: This part is supplied by ESCT Fab Support as a new, OEM-compatible second-source component, verified to the form, fit and function of Lam Research part number 716-007136-002(U1). It is not an original OEM part and is not sold as one. It is not manufactured by, endorsed by, or affiliated with Lam Research, and all manufacturer names and part numbers are quoted for identification and compatibility purposes only.
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