EDGE RING(385ESC)

PART DETAILS

716-023013-004(U1)
EDGE RING(385ESC)

OEM P/N: 

716-023013-004(U1)

ESCT P/N: 

ES2099-006

PART TYPE:

2nd Source NEW

OEM: 

LAM
MORE INFO

716-023013-004(U1) edge ring for Lam Research etch systems

The 716-023013-004(U1) (EDGE RING(385ESC)) is a plasma-facing edge ring used in Lam Research etch equipment. Positioned around the wafer at the electrostatic chuck, it manages the thermal, electrical and geometric environment at the wafer edge, supports etch uniformity into the outermost dies, and protects the chuck surface from plasma exposure. The 385ESC designation ties this variant to its chuck configuration.

Edge rings are consumables in the truest sense: they absorb the plasma exposure the wafer edge and chuck would otherwise see, and they erode doing it. Their condition is process-relevant long before they fail mechanically.

Functional role of the 716-023013-004(U1) at the wafer edge

  • Edge environment control maintains consistent plasma and thermal conditions across the transition from wafer to chamber.
  • Etch uniformity supports stable etch rate and profile in the outer wafer zone, protecting edge-die yield.
  • Chuck protection shields the electrostatic chuck’s outer region from ion bombardment and radical attack.
  • Defined seating presents the intended geometry to the plasma so chamber behaviour stays repeatable.

Material and design characteristics

  • Plasma-compatible material selected for the process chemistry, machined to tight tolerances.
  • Controlled surface finish for predictable erosion behaviour and low particle generation.
  • Variant-specific geometry (EDGE RING(385ESC)) matched to the chuck and chamber configuration.

Common wear indicators

  • Edge-die yield loss or edge etch-rate drift in process data.
  • Visible erosion, thinning or surface texturing at inspection.
  • Rising particle counts associated with the wafer edge region.
  • Chamber matching drift that tracks ring age.

Replacement best practices

  • Replace at the recommended interval or measured wear limit rather than at failure.
  • Handle as a process-critical clean part.
  • Inspect the chuck seating surface and adjacent rings at each change.
  • Confirm the correct variant for your chamber before installation, then follow normal requalification practice.

Why source the 716-023013-004(U1) from ESCT Fab Support

ESCT Fab Support supplies the 716-023013-004(U1) edge ring as a verified 2nd New OEM-compatible consumable for Lam Research etch systems, helping fabs manage consumable cost and availability on current and legacy chambers. Our engineers can confirm the correct variant against your chamber configuration before you order.

Frequently asked questions

What is the 716-023013-004(U1) edge ring used for?

It is a plasma-facing edge ring used in Lam Research etch equipment, fitted around the wafer to manage conditions at the wafer edge and protect the electrostatic chuck and surrounding hardware.

What does an edge ring do?

It defines the thermal, electrical and geometric environment immediately beyond the wafer edge, keeping etch conditions consistent in the outermost dies and shielding the chuck from plasma exposure.

Is an edge ring a consumable?

Yes. It erodes under plasma exposure and is replaced at a scheduled interval or measured wear limit as part of chamber consumable management.

What are the signs an edge ring needs replacement?

Edge-die yield loss, drift in edge etch rate or profile, visible erosion or surface texturing of the ring, and rising particle counts associated with the wafer edge.

Can a worn edge ring affect process results?

Yes. Ring erosion changes the sheath and thermal environment at the wafer edge, which shows up as etch non-uniformity in the outer zone before any mechanical failure occurs.

What does the EDGE RING(385ESC) designation refer to?

It identifies this specific ring variant and fitment configuration in the catalogue. Compatibility should be confirmed against part number 716-023013-004(U1) and your chamber configuration.

Should adjacent components be inspected at replacement?

Yes. Focus rings, cover rings and the chuck seating surfaces wear in the same environment and are best checked in the same intervention.

Is compatibility verification important before ordering?

Yes. Material, dimensions and configuration should be confirmed against OEM part number 716-023013-004(U1) and your tool configuration before installation.

Can ESCT verify compatibility before shipment?

Yes. ESCT supports form, fit and functional verification aligned with OEM requirements before the part ships.

Is this an original OEM part?

This product is supplied as a 2nd New OEM-compatible part, verified to meet form, fit, and functional requirements aligned with the relevant part number. It is not an original OEM manufacturer part.

Summary

The 716-023013-004(U1) (EDGE RING(385ESC)) is a plasma-facing edge ring consumable for Lam Research etch equipment. Its condition directly affects edge etch uniformity, edge-die yield and chuck protection. Sourcing it from ESCT Fab Support gets you verified quality, reduced lead times, and expert technical support, keeping your equipment stable, efficient, and production-ready.

Disclaimer: This part is supplied by ESCT Fab Support as a new, OEM-compatible second-source component, verified to the form, fit and function of Lam Research part number 716-023013-004(U1). It is not an original OEM part and is not sold as one. It is not manufactured by, endorsed by, or affiliated with Lam Research, and all manufacturer names and part numbers are quoted for identification and compatibility purposes only.

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