OEM P/N:
ESCT P/N:
PART TYPE:
OEM:
The MxP+ Simple Cathode Support is the structural and electrical mounting assembly that carries the cathode (lower electrode) within an Applied Materials MxP+ 200 mm plasma etch chamber. Configured for chamber position B/C, it provides the mechanical platform, alignment and grounding interface on which the wafer-bearing electrode is built, while routing RF, cooling and gas services to the electrode stack.
In a capacitively coupled etch chamber, the cathode assembly defines wafer position, thermal contact and the RF delivery path that sustains the plasma. The cathode support holds these elements in precise, repeatable alignment under continuous thermal cycling and plasma exposure, so its mechanical integrity and electrical continuity directly influence etch uniformity, chucking behaviour and chamber matching.
This item is supplied as a 2nd-source new assembly matched to the form, fit and function of OEM P/N 0010-04489 / 0010-04487. It is the support assembly only and excludes the electrostatic chuck (ESC) and the high-voltage module.
Within the MxP+ chamber, the cathode support works with the electrode, chuck and RF/cooling services to maintain a stable process environment, providing:
Stable geometry under repeated thermal and vacuum cycling preserves accurate electrode positioning, supporting:
A clean electrical interface maintains the RF path that drives the plasma:
Because it underpins the electrode stack, a degraded cathode support can contribute to:
Repeated thermal cycling and handling during preventive maintenance can wear mounting interfaces or distort the support, shifting electrode alignment.
Worn grounding or RF interfaces can raise impedance, cause arcing, or destabilise the plasma.
Damaged cooling or gas interfaces can create leaks that affect wafer temperature control and process repeatability.
Replacement should follow AMAT-approved chamber, ESD and vacuum procedures:
OEM lead times and the cost of MxP+ chamber rebuilds make a reliable secondary source useful. ESCT Fab Support provides:
It is the structural and electrical mounting assembly for the cathode (lower electrode) in an Applied Materials MxP+ 200 mm etch chamber, configured for position B/C. It holds the electrode stack in precise alignment and provides the RF, grounding, cooling and gas interfaces.
It is supplied as a 2nd-source new assembly matched to the form, fit and function of OEM P/N 0010-04489 / 0010-04487. It is a cost-effective compatible alternative and is not an original OEM-branded part.
No. This item is the cathode support assembly only and explicitly excludes the ESC and the high-voltage module, which are transferred from the existing assembly per OEM procedure.
It can cause electrode misalignment, RF instability, cooling or gas leaks and loss of chamber matching, leading to etch non-uniformity and process drift.
Yes. Assemblies undergo dimensional and visual inspection against the OEM specification, with cleanroom-appropriate handling and packaging prior to dispatch.
Lead time depends on current inventory; an indicative lead time of around 8 weeks applies, with expedited options where available to support planned maintenance.
The MxP+ Simple Cathode Support (OEM P/N 0010-04489 / 0010-04487) is the lower-electrode mounting assembly for Applied Materials MxP+ 200 mm etch chambers, position B/C. By holding the electrode stack in precise alignment with stable RF, grounding and service interfaces, it directly supports etch uniformity, chucking performance and chamber matching. Sourcing through ESCT Fab Support provides inspected, OEM-matched hardware with controlled cost and lead time.
Disclaimer: This part is supplied by ESCT Fab Support as a new, OEM-compatible second-source component, verified to the form, fit and function of Applied Materials part number 0010-04489 0010-04487. It is not an original OEM part and is not sold as one. It is not manufactured by, endorsed by, or affiliated with Applied Materials, and all manufacturer names and part numbers are quoted for identification and compatibility purposes only.
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