OEM P/N:
ESCT P/N:
PART TYPE:
OEM:
The Insert Ring carrying OEM part number 0200-10446 is a precision-machined annular consumable that sits within the upper chamber assembly of a 300 mm plasma etch process module. Unlike a focus ring or edge ring that surrounds the wafer at substrate level, an insert ring is a structural and dielectric component installed deeper in the chamber stack, typically nested against the chamber liner, gas distribution hardware or the dielectric window seat, where it shapes the boundary of the plasma volume and seats adjacent ceramic and metallic parts to a defined plane. In a Tokyo Electron-style 300 mm etch chamber the part performs an analogous role, and ESCT supplies it under part number ES1099-022 as a 2nd source new component verified to the original form, fit and function.
Because the insert ring straddles the line between a wear consumable and a fixed mechanical interface, it influences several behaviours at once: it defines a gap that confines the plasma, it provides an electrically defined surface that can either be grounded or floating depending on its location, and it acts as a sacrificial barrier that protects more expensive hardware such as the chamber body, the dielectric window and the gas injection plate from direct ion and radical attack. The condition of this single ring therefore feeds directly into etch rate stability, edge uniformity and the chamber’s particle budget.
A worn, eroded or cracked insert ring rarely announces itself with a hard fault. Instead it drifts the process, shifting critical dimensions at the wafer edge, raising particle counts and lengthening the time the tool spends in qualification. For high-volume fabs running tight statistical process control, keeping a qualified insert ring on the shelf is a low-cost insurance policy against unplanned chamber downtime.
The insert ring is not a single-purpose part. Within the chamber stack it simultaneously locates hardware, confines plasma and manages the electrical environment at the chamber periphery. Its principal functions include the following.
An insert ring earns its place in the chamber through material selection. The part must survive an aggressive plasma environment for thousands of RF hours while holding tight dimensional tolerances and a stable surface condition. Two material domains govern its performance.
Insert rings in etch service are typically produced from high-purity ceramics such as alumina or yttria-bearing materials, or from quartz, depending on the chamber zone and the chemistries in use. These materials resist fluorine- and chlorine-based etch gases, tolerate high surface temperatures and erode slowly and predictably under ion bombardment.
Beyond chemistry, the ring depends on precise machining. Flatness, concentricity and bore tolerances determine how cleanly it seats adjacent hardware and how repeatable the confinement gap remains.
Because the insert ring sets a boundary condition for the plasma, even modest degradation propagates into measurable process and yield effects.
Continuous ion bombardment and reactive radical flux slowly mill the exposed surfaces of the ring. As the surface roughens and the geometry recedes, the confinement gap opens, the electrical boundary shifts and the part begins to shed particles. This is the dominant, expected wear mechanism and the primary reason the ring is treated as a scheduled consumable.
Ceramic and quartz insert rings are brittle. Thermal cycling, uneven seating or mishandling during preventive maintenance can initiate cracks or chip the edges. A cracked ring loses dimensional integrity, can arc at the fracture and becomes an immediate particle source, so any visible damage warrants replacement rather than reuse.
Process by-products accumulate on the ring as polymer or film layers. Beyond a threshold these deposits crack and flake under thermal and stress cycling, releasing particles onto the wafer and altering the local surface chemistry. Build-up also changes the effective electrical and gas-flow boundary, contributing to slow process drift between cleans.
Replacement should follow the tool owner’s documented preventive-maintenance procedure. The following sequence reflects good practice for a chamber-internal ceramic insert ring; always defer to the equipment manual and facility safety rules.
Insert rings are consumed on a predictable cadence, which makes them ideal candidates for a managed spares programme rather than reactive ordering. Sourcing through ESCT Fab Support offers several practical advantages.
It defines and confines the plasma boundary at the chamber edge, seats and aligns adjacent ceramic and metallic hardware to a repeatable plane, and acts as a sacrificial barrier that protects higher-value parts from ion and radical attack. Its condition directly affects edge uniformity and particle performance.
No. This is a 2nd source new component supplied by ESCT Fab Support as an OEM-compatible part. It is verified to the form, fit and function of AMAT OEM P/N 0200-10446 but is not an original OEM part and is not sold as one.
Watch for edge critical-dimension drift, rising particle counts, longer chamber qualification times or any visible erosion, cracking or heavy deposition during preventive maintenance. Most fabs replace insert rings on a scheduled RF-hour or wafer-count interval rather than waiting for a measurable fault.
Insert rings in etch service are typically high-purity ceramic or quartz selected for plasma and chemical resistance, dielectric strength and low, predictable erosion. The exact material is matched to the original specification so that electrical and process behaviour is preserved.
The typical lead time is 4-5 weeks. Because insert rings are consumed on a predictable schedule, we recommend holding qualified spares in your preventive-maintenance kits so replacement is never gated by procurement.
It is not recommended. Even minor chips on a brittle ceramic or quartz ring create particle sources, can promote arcing and alter the local boundary condition. Any visible cracking or chipping should be treated as cause for replacement.
The Insert Ring (OEM P/N 0200-10446, ESCT P/N ES1099-022) is a precision ceramic or quartz consumable that confines the plasma boundary, seats adjacent chamber hardware and shields high-value parts in 300 mm plasma etch process modules. Its dimensional accuracy, material purity and surface condition feed directly into edge uniformity, particle performance and chamber qualification time. Supplied by ESCT as a new, 2nd source, OEM-compatible part with a 4-5 week lead time, it is well suited to managed preventive-maintenance spares programmes that keep etch chambers running within specification.
Disclaimer: This part is supplied by ESCT Fab Support as a new, OEM-compatible second-source component, verified to the form, fit and function of Applied Materials part number 0200-10446. It is not an original OEM part and is not sold as one. It is not manufactured by, endorsed by, or affiliated with Applied Materials, and all manufacturer names and part numbers are quoted for identification and compatibility purposes only.
Fill out the form below to request a quote for the part/s you require, making sure to include the OEM part number.
If the part you are looking for is not listed, get in touch and we will try to source it for you through our wide network of partners and suppliers.
We use cookies We use analytics cookies to see how visitors use this site, so we can improve it. They are set only if you accept. Read our Cookie Policy.
