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The NEST Test Cathode Electrode, OEM part number 3D10-250316-11(S), is a plasma-facing cathode component used in Tokyo Electron (TEL) 300 mm plasma etch process chambers. As a cathode-class part, it forms part of the powered electrode stack at the base of the chamber, where it sits beneath or adjacent to the electrostatic chuck assembly and helps establish the radio-frequency (RF) field that sustains the plasma and accelerates ions towards the wafer surface. The “(TEST)” designation in the part name reflects its provenance as a characterisation or qualification-grade electrode, a part used to validate chamber behaviour and electrode geometry, but it is supplied here as a fully functional cathode of the same form, fit and function as the production component.
In a capacitively coupled etch reactor, the cathode is the electrode through which RF power is delivered into the plasma. The wafer rests above it, and the sheath voltage developed across the cathode determines the energy and directionality of the ions bombarding the wafer. Because this electrode is directly exposed to the plasma and to continuous ion impact, it is treated as a consumable in fab maintenance planning: its surface condition, flatness and electrical contact integrity all degrade over time and must be restored on a defined preventive maintenance cycle.
For fabs running TEL 300 mm etch platforms, securing a reliable, qualified source of cathode electrodes protects tool availability and edge-to-edge process uniformity. ESCT Fab Support offers this electrode as a second-source new part, providing an OEM-compatible alternative that minimises dependence on a single supply channel while preserving the dimensional and electrical characteristics the chamber requires.
The cathode electrode is one of the most electrically and thermally critical surfaces in a plasma etch chamber. It is responsible for coupling RF energy into the discharge while simultaneously defining the lower boundary of the plasma volume that processes the wafer. Within the TEL 300 mm chamber, the electrode performs several interlocking functions:
A cathode electrode must combine electrical conductivity, plasma resistance and dimensional stability under continuous thermal and ion loading. Its performance is judged on how well it holds those properties across thousands of RF hours.
The electrode material is selected to carry RF current with minimal loss while withstanding sustained ion bombardment without excessive erosion or particle generation. Surface finish and bulk conductivity are tightly controlled so that the sheath develops uniformly across the full electrode face.
Flatness and thickness tolerances directly govern sheath uniformity and the electrode-to-wafer gap. The part must hold its geometry as it cycles repeatedly between ambient and process temperature.
Because the cathode shapes the electric field that drives the etch, its condition feeds directly into the metrics fabs care about most, uniformity, repeatability and defectivity. A worn, contaminated or poorly seated electrode can quietly erode yield long before it triggers a hard fault.
Continuous ion bombardment gradually erodes the electrode face, roughening the surface and changing its local geometry. As erosion progresses, the sheath becomes less uniform, etch rate drifts, and the electrode begins shedding particles that land on wafers as defects.
The electrical interface between the cathode and the RF feed can loosen or oxidise over time, raising contact resistance. This produces localised heating, unstable impedance matching and RF reflected-power excursions that show up as process drift and tool alarms.
Repeated heating and cooling cycles stress the electrode and any bonded or mated interfaces, and reaction by-products accumulate as polymer or residue films. Build-up alters the effective electrode surface and, if it flakes, becomes a direct source of particulate contamination.
Replacing a cathode electrode is a precision task carried out under cleanroom discipline and in line with the tool owner’s preventive maintenance procedures. The sequence below outlines a typical approach; always follow the equipment manufacturer’s documented method and safety requirements.
Cathode electrodes are recurring-replacement items, so a sound spares strategy treats them as planned consumables rather than emergency purchases. Sourcing through ESCT Fab Support gives engineering and procurement teams a dependable, qualified channel for these parts.
It is the powered electrode that couples RF energy into the plasma and establishes the sheath that accelerates ions towards the wafer. Its surface condition and flatness directly influence etch uniformity, profile control and particle performance.
No. This electrode is supplied as a second-source new, OEM-compatible part. It is not an original OEM component, but it is built and verified to match the form, fit and function of OEM part number 3D10-250316-11(S) for use in the corresponding TEL 300 mm etch chambers.
The designation reflects the electrode’s origin as a characterisation or qualification-grade part used to validate chamber behaviour and electrode geometry. It is supplied here as a fully functional cathode of equivalent form, fit and function.
Service life depends on process chemistry, RF power, duty cycle and cleaning regime, so it is best defined by RF hours or wafer count tracked against your own preventive maintenance data rather than a fixed calendar interval.
The typical lead time is approximately 4 to 5 weeks. We recommend holding buffer stock or placing scheduled orders to align deliveries with your planned maintenance windows and protect tool availability.
Match the OEM part number 3D10-250316-11(S) against your chamber’s bill of materials and current configuration. Our technical team can help verify compatibility with your specific TEL 300 mm etch chamber before you order.
The NEST Test Cathode Electrode (OEM P/N 3D10-250316-11(S)) is a plasma-facing cathode for Tokyo Electron 300 mm plasma etch chambers, responsible for coupling RF power into the discharge and defining the sheath that drives anisotropic etching. As a continuously eroded consumable, its flatness, conductivity and contact integrity govern etch uniformity, RF stability and particle performance, making proactive replacement central to sustained yield. Supplied by ESCT Fab Support as a second-source new, OEM-compatible part with a typical 4 to 5 week lead time, it gives fabs a dependable alternative source for maintaining etch-chamber performance.
Disclaimer: This part is supplied by ESCT Fab Support as a new, OEM-compatible second-source component, verified to the form, fit and function of Nest part number 3D10-250316-11(S). It is not an original OEM part and is not sold as one. It is not manufactured by, endorsed by, or affiliated with Nest, and all manufacturer names and part numbers are quoted for identification and compatibility purposes only.
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