OEM P/N:
ESCT P/N:
PART TYPE:
OEM:
The Mass Resolving Slit (MRS) vane, OEM part number 0020-99710 and designated CX2305, is a precision beamline aperture jaw used in the mass-resolution stage of Applied Materials ion implanter platforms. Each vane forms one of the two opposing blades that together define the resolving slit, the narrow gap positioned at the dispersive focal plane of the analysing magnet, where the spatially separated ion species converge after the beam has been bent through the mass-analysis sector. Because the slit is bounded by two facing jaws, the vanes are always supplied and fitted in pairs, hence the “used in pairs” designation in the part name.
In operation, the analysing magnet disperses the extracted ion beam so that ions of differing mass-to-charge ratio (m/z) arrive at slightly different lateral positions in the focal plane. The MRS vanes intercept everything that falls outside the intended aperture width, allowing only the target dopant species (for example a specific boron, phosphorus, arsenic or BF2 charge state) to pass downstream to the acceleration column and wafer. The vanes therefore act simultaneously as a spatial filter and as a beam-defining aperture, and their edge condition, alignment and gap symmetry directly govern the mass resolution the tool can achieve.
As an intercepting component, each vane is continuously bombarded by off-axis ions, neutrals and scattered particles. This makes the MRS vane both a critical optical element and a wear part: its working edges erode and contaminate over time, and worn or mismatched vanes are a common, often under-diagnosed cause of resolution drift and cross-contamination in production implanters.
The pair of vanes establishes the physical boundary of the resolving aperture and defines the mass window that reaches the wafer. Their combined functions within the beamline include:
MRS vanes sit in a high-vacuum, high-energy environment and must combine dimensional stability with resistance to sputter erosion and thermal stress. The two performance dimensions that matter most in service are described below.
The vane edges take the direct impact of intercepted ions and gradually erode through sputtering. Edge geometry and surface condition must be maintained so that the slit boundary stays sharp; a rounded or pitted edge widens the effective transition region of the aperture and degrades mass resolution. Materials and coatings are selected to minimise sputter yield and to limit the generation of secondary particles that could redeposit elsewhere in the beamline.
Because the vanes absorb the rejected beam power, they experience substantial localised heating, particularly under high-current implant recipes. The component must conduct that heat into its mounting and tolerate repeated thermal cycling without warping, cracking or shifting alignment. Thermal distortion of even one vane changes the slit width and shifts the mass window, so thermal behaviour is integral to resolution stability.
Because the MRS vanes define the mass window that reaches the wafer, their condition has a direct line to process results and device yield. Consequences of degraded or mismatched vanes include:
Continuous ion impact sputters material from the working edges, gradually rounding and receding them. This widens the effective slit transition, softens the resolution edge and shifts the centre of the mass window, the most fundamental wear mode of any resolving aperture jaw and the primary reason for scheduled replacement.
Sputtered and condensed material from earlier implants accumulates on the vane faces. These deposits can flake to generate particles, or be re-sputtered back into the beam, causing memory-effect cross-contamination between species. Build-up also distorts the local geometry of the aperture edge.
High intercepted power can warp a vane or loosen its seating, while unequal wear between the two jaws breaks the symmetry of the slit. A mismatched pair produces an off-centre, asymmetric aperture, which is why the vanes are replaced together rather than singly.
Replacement should be carried out by trained implant maintenance personnel during a scheduled preventive-maintenance window, following the OEM service procedure for the specific platform. A typical sequence is:
Mass resolving slit vanes are recurring consumables tied directly to resolution and contamination performance, so keeping a qualified matched pair on the shelf protects both yield and uptime. ESCT Fab Support helps fabs manage that risk:
It forms one jaw of the mass resolving slit at the focal plane of the analysing magnet. Together the pair defines the aperture that lets only the selected dopant species through to the wafer while rejecting adjacent masses, contaminant charge states and neutrals.
No. This is a new, OEM-compatible component supplied by ESCT Fab Support and verified to the form, fit and function of AMAT OEM P/N 0020-99710. It is not an original OEM-branded part and is not sold as such.
The resolving slit is bounded by two opposing jaws. If only one is replaced, unequal wear between old and new vanes makes the aperture asymmetric and off-centre, degrading resolution. Fitting a matched pair keeps the slit symmetric about the beam axis.
Typical indicators are a gradual loss of mass resolution, rising cross-contamination or memory effects between recipes, dose and uniformity drift, increased tuning effort, or particle excursions. Visible edge erosion or heavy deposition at a PM inspection also signals end of life.
The nominal lead time is approximately 2.5 weeks. Because the vanes are a planned-replacement consumable, holding a matched pair in your spares inventory is the most reliable way to avoid unplanned downtime.
Components are built to match the dimensional and material characteristics of the OEM part so that, once correctly set and centred, slit width and resolution match your baseline. As with any beamline change, re-tune and verify resolution, contamination, dose and uniformity before returning to production.
The Mass Resolving Slit vane (CX2305, OEM P/N 0020-99710, ESCT P/N ES227-0010) is a precision beamline aperture jaw that, as one of an opposed pair, defines the resolving slit at the focal plane of an AMAT ion implanter analysing magnet. By setting the mass window and intercepting rejected species, the vanes govern mass resolution, contamination control and beam transmission. As an intercepting consumable they erode, accumulate deposits and can distort thermally, so they are replaced as a matched pair on a planned PM cycle. ESCT Fab Support supplies these vanes verified to OEM form, fit and function, as matched pairs, with a nominal 2.5-week lead time to keep your implanter resolving cleanly and running productively.
Disclaimer: This part is supplied by ESCT Fab Support as a new, OEM-compatible second-source component, verified to the form, fit and function of Applied Materials part number 0020-99710. It is not an original OEM part and is not sold as one. It is not manufactured by, endorsed by, or affiliated with Applied Materials, and all manufacturer names and part numbers are quoted for identification and compatibility purposes only.
Fill out the form below to request a quote for the part/s you require, making sure to include the OEM part number.
If the part you are looking for is not listed, get in touch and we will try to source it for you through our wide network of partners and suppliers.
