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The Graphite Suppression and Extraction Electrode Assembly is one of the most heavily duty-cycled components in the front end of an AMAT XR80 ion implanter. It sits immediately downstream of the arc chamber aperture, in the extraction region where ions are first pulled out of the plasma and accelerated into the beamline. The assembly combines the extraction electrode, which establishes the high-voltage gradient that draws ions from the source, with the suppression (or suppressor) electrode, a negatively biased optic positioned to reject back-streaming secondary electrons. Machined from high-purity graphite, the assembly tolerates the intense thermal and ion-bombardment loading of the extraction gap while keeping metallic contamination of the beam to a minimum.
Because extraction optics define the initial shape, divergence and energy of the ion beam, this electrode assembly has a direct bearing on beam current stability, emittance and ultimately on implant uniformity at the wafer. Even small changes in the electrode surface profile (erosion, pitting, sputter redeposition or warpage) alter the electrostatic field in the extraction gap and degrade the beam before it ever reaches the analysing magnet. For this reason the suppression and extraction electrode is treated as a scheduled consumable in most high-throughput fabs rather than a run-to-failure part.
ESCT Fab Support offers this assembly under part number ES227-0549 as a dimensionally faithful replacement for AMAT OEM P/N 0020-85089, intended to restore original extraction performance during planned source rebuilds and preventive-maintenance windows.
In the extraction region, the electrode assembly performs several interdependent electro-optical tasks. It is not a passive structural part; it is an active optic whose geometry and bias voltages jointly determine how cleanly ions are pulled from the plasma and launched into the analysing section of the beamline.
Graphite is the material of choice for extraction and suppression electrodes because it combines a high sublimation temperature, excellent thermal-shock resistance and a low sputter yield relative to most metals. Crucially, as a low-atomic-number element, carbon sputtered from the electrode does not introduce the heavy-metal contamination that a stainless or refractory-metal electrode would, keeping the beam and the wafer surface clean.
The electrode aperture diameter, edge sharpness and gap spacing set the achievable beam current at a given extraction voltage. A clean, correctly profiled electrode supports stable perveance-matched operation, allowing the implanter to deliver consistent beam current with minimal arcing or glitching during high-voltage operation.
Because the extraction electrodes set the quality of the beam at its origin, their condition propagates through every downstream stage, mass analysis, acceleration and wafer scanning. A degraded suppression or extraction electrode is a common root cause of beam instability that is easily mistaken for a problem elsewhere in the beamline.
Continuous ion bombardment in the extraction gap slowly sputters graphite away from the aperture edges. As the aperture widens and the edges round over, the extraction field weakens and beam optics drift, gradually reducing the deliverable beam current and forcing more frequent re-tuning.
Sputtered source material and process by-products redeposit on electrode surfaces, particularly when running aggressive or carbon-bearing species. These deposits can bridge gaps, create field non-uniformities and eventually flake, generating particulate and triggering high-voltage breakdown across the extraction gap.
Repeated thermal cycling, combined with localised arc strikes during high-voltage glitching, can chip, crack or pit the graphite. Arc tracking across an insulating deposit or a damaged edge degrades the suppression function and may compromise the assembly’s high-voltage standoff.
Electrode replacement is normally carried out during a scheduled source rebuild or PM. The following sequence outlines good practice; always work to your site’s qualified procedure and the applicable AMAT service documentation.
Extraction and suppression electrodes are consumables whose condition drives both yield and uptime, so most fabs keep them on the shelf rather than ordering reactively. Sourcing through ESCT Fab Support helps maintain availability and control cost without compromising on form, fit and function.
It forms the first optical stage of the implanter. The extraction electrode pulls ions out of the arc-chamber plasma and accelerates them into the beamline, while the negatively biased suppression electrode blocks back-streaming secondary electrons. Together they set the initial shape, current and energy of the ion beam.
No. ES227-0549 is supplied as a new, OEM-compatible replacement for AMAT P/N 0020-85089. It is verified to the original form, fit and function but is not an original Applied Materials branded part, and ESCT Fab Support is not affiliated with Applied Materials.
Graphite withstands the high thermal load and ion bombardment of the extraction gap, has a relatively low sputter yield and, as a low-atomic-number material, does not introduce the heavy-metal contamination that a metallic electrode would sputter into the beam.
Typical indicators include rising high-voltage glitch and arc rates, falling deliverable beam current, increasing difficulty holding tune, and visible erosion, deposits or cracking on inspection during a source PM. Most fabs replace it on a defined source-hours interval.
Yes. After any extraction-optic change you should set the extraction gap and alignment to specification, condition the high voltage gradually and re-verify beam current, glitch rate and uniformity against your qualification baseline before returning the tool to production.
The indicative lead time is approximately 2.5 weeks. Because this is a planned-PM consumable, we recommend holding buffer stock so a replacement is always on hand for scheduled source rebuilds.
The Graphite Suppression and Extraction Electrode Assembly (AMAT P/N 0020-85089, ESCT P/N ES227-0549) is a high-purity, beam-forming optic at the front end of the AMAT XR80 ion implanter. By establishing the extraction field, shaping the plasma meniscus and suppressing back-streaming electrons, it directly governs beam current, stability and implant uniformity. As a graphite consumable subject to sputter erosion, deposit build-up and arc damage, it is best managed as a scheduled PM item with buffer stock on hand. ESCT Fab Support supplies it as a form-fit-function replacement to keep your sources running with minimal downtime.
Disclaimer: This part is supplied by ESCT Fab Support as a new, OEM-compatible second-source component, verified to the form, fit and function of Applied Materials part number 0020-85089. It is not an original OEM part and is not sold as one. It is not manufactured by, endorsed by, or affiliated with Applied Materials, and all manufacturer names and part numbers are quoted for identification and compatibility purposes only.
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