Supressionn Power Supply

PART DETAILS

1140-90115
Supressionn Power Supply

OEM P/N: 

1140-90115

ESCT P/N: 

ES3033-142

PART TYPE:

N/A

OEM: 

AMAT
Repair Offered
MORE INFO

Suppression power supply (OEM P/N 1140-90115), extraction suppression bias supply for AMAT Quantum / xR-class ion implantation systems

ESCT P/N ES3033-142, OEM-compatible replacement for Applied Materials ion source extraction optics

The Suppression Power Supply, Applied Materials OEM part number 1140-90115, is a dedicated high-voltage source that energises the suppression electrode within the ion source extraction assembly of AMAT Quantum and xR-class ion implanters. In an ion implantation system the extraction optics pull a positively charged ion beam out of the source arc chamber through a precisely shaped aperture. Behind the grounded extraction electrode sits a suppression electrode that is held at a strongly negative potential. This negative bias is what the 1140-90115 supply delivers and regulates.

The purpose of that negative bias is to create a localised potential barrier that prevents secondary electrons, generated downstream in the beamline and at the ground electrode, from streaming back into the high-voltage extraction gap. Without effective electron suppression, those backstreaming electrons would be accelerated into the source, distorting the extracted beam, loading the extraction supply, and corrupting the beam-current measurement on which dose control depends. The suppression supply therefore sits at the heart of beam formation, even though it carries only a small fraction of the total extraction current.

Because it operates floating at the source high-voltage reference and must hold a stable negative output under a noisy, arc-prone load, the suppression power supply is a precision high-voltage subassembly rather than a commodity bench supply. When it drifts or fails, beam transmission and dose repeatability suffer immediately, which is why a reliable, form-fit-function replacement such as ESCT P/N ES3033-142 is a valued line item in any implant spares inventory.

Functional role of the suppression power supply in AMAT ion implanter platforms

Within the extraction power electronics rack, the suppression supply works alongside the main extraction and arc supplies to define the electrostatic field geometry at the source aperture. Its job is narrow but critical: present a clean, stable negative voltage to the suppression electrode regardless of fluctuating beam load. Its principal functions include the following.

  • Generating and regulating a negative bias on the suppression electrode to form the electron-suppression potential well in the extraction gap.
  • Blocking secondary and backstreaming electrons from re-entering the source, protecting the extraction supply from spurious electron loading.
  • Holding output stability while floating at the source extraction reference potential, often many tens of kilovolts above chassis ground.
  • Maintaining a well-defined beam optical envelope so that extracted current and emittance remain consistent shot to shot.
  • Providing current-limit and fault behaviour that survives the frequent high-voltage arcs and glitches inherent to a hot ion source.
  • Feeding voltage and current monitor signals back to the implanter control system for interlock, logging and beam-tune diagnostics.

Electrical and signal performance

High-voltage regulation and stability

The defining performance metric of a suppression supply is the steadiness of its negative output under a dynamic load. As beam current and source conditions change, the supply must hold its setpoint with minimal droop or overshoot so that the suppression field, and therefore the extracted beam optics, stay constant.

  • Tight line and load regulation of the negative output voltage across the operating range.
  • Low output ripple and noise to avoid modulating beam current and dose measurement.
  • Fast, well-damped recovery after arc-induced transients without latching off unnecessarily.
  • Full high-voltage isolation between the floating output stage and the chassis reference.

Fault handling and monitoring

A suppression supply spends its life connected to an electrode that arcs. Its electronics must therefore tolerate repeated flashover events, fold back safely under fault, and report status accurately to the host controller so that the implanter can interlock or retune as required.

  • Programmable current limit and over-current foldback to survive electrode flashover.
  • Accurate voltage and current readback for closed-loop beam tuning and event logging.
  • Arc-detect and recovery logic that re-establishes output after a glitch.
  • Interlock and enable signalling integrated with the implanter safety chain.

Impact on tool performance and yield

Although the suppression supply handles modest power, its condition propagates directly into the metrics that matter on the implant floor. A degraded or unstable unit undermines beam quality and dose accuracy long before it fails outright.

  • Loss of effective electron suppression, raising extraction-supply load and triggering high-voltage faults.
  • Beam-current instability that corrupts the dose integration used to control implant uniformity.
  • Wafer-level dose and uniformity excursions that put device threshold-voltage and junction targets at risk.
  • Increased beam-tune time and frequent retunes, eroding tool availability and throughput.
  • Nuisance source trips and unscheduled downtime when the supply latches off mid-run.

Common failure modes

High-voltage insulation breakdown

Sustained operation at high negative potential stresses potting compounds, standoffs and cable terminations. Tracking, partial discharge and eventual insulation breakdown are classic end-of-life signatures, often appearing first as intermittent arcing or erratic output before a hard short develops.

Output drift and regulation loss

Ageing of the regulation feedback path, reference components and high-voltage multiplier stages causes the output to drift off setpoint or develop excessive ripple. The suppression field then becomes inconsistent, manifesting as wandering beam current and dose that will not hold to specification.

Arc-damage and component fatigue

Repeated electrode flashover injects energetic transients back into the supply. Over time this fatigues output devices, snubbers and protection circuitry, leading to frequent fault latching, failure to recover after arcs, or a complete loss of output following a particularly severe discharge.

Installation and replacement guidance

The suppression supply is mounted in the implanter high-voltage power electronics enclosure and must be handled with full respect for stored-energy and high-voltage hazards. The following sequence summarises a safe, repeatable replacement; always defer to the relevant AMAT service documentation and your site safety procedures.

  • Place the implanter in a safe state, disable the source and extraction high voltage, and lock out / tag out the supply mains.
  • Allow the dwell time for capacitive discharge, then verify zero potential with an approved high-voltage grounding stick before touching any terminal.
  • Label and disconnect the high-voltage output lead, control/monitor harness and primary power connections to the existing unit.
  • Release the mounting hardware and withdraw the failed supply, noting its orientation and cable routing for the replacement.
  • Install ES3033-142 in the same position, secure it, and reconnect the output, control and power connections, with clean, tight high-voltage terminations.
  • Remove lockout, restore power, and bring up the supply at low setpoint to confirm voltage and current readback before full extraction.
  • Retune the source, verify beam current stability and dose repeatability, and log the change in the tool maintenance record.

Spare parts strategy for AMAT ion implanter fleets

High-voltage extraction supplies are exactly the kind of low-frequency, high-impact failure that justifies holding a verified spare. ESCT Fab Support supplies ES3033-142 as a form-fit-function alternative to AMAT 1140-90115, giving implant teams a cost-effective route to fleet uptime without depending on a single OEM channel.

  • Cross-referenced to AMAT OEM P/N 1140-90115 for confident identification against your existing bill of materials.
  • Verified to form, fit and function so it drops into the same enclosure position and connections.
  • A practical alternative to extended OEM lead times, helping shorten mean time to repair on a down tool.
  • Suitable for held-spare stocking across multi-tool implant fleets to protect throughput commitments.
  • Supported by ESCT technical staff familiar with AMAT source and extraction subsystems.

Frequently asked questions

What does the suppression power supply actually do?

It applies a regulated negative bias to the suppression electrode in the ion source extraction optics. That negative potential blocks secondary and backstreaming electrons from re-entering the extraction gap, which keeps the extracted ion beam well formed and protects the main extraction supply from spurious electron loading.

Is ES3033-142 an original AMAT part?

No. ES3033-142 is supplied as a new, OEM-compatible replacement that is cross-referenced to AMAT OEM P/N 1140-90115 and verified to form, fit and function. It is not an original AMAT-branded part and is offered as an independent alternative for maintenance and repair.

How do I know the suppression supply has failed?

Typical symptoms include unstable or drifting beam current, recurring extraction high-voltage faults, the supply failing to hold its setpoint, or repeated fault latching after source arcs. Confirm by checking the voltage and current readback against the expected suppression setpoint during a controlled beam-up.

Why does electron suppression matter for yield?

Backstreaming electrons distort beam optics and corrupt the beam-current signal used for dose integration. Because implant dose directly sets device parameters such as threshold voltage and junction depth, an ineffective suppression field translates into uniformity and dose excursions that can reduce wafer yield.

What precautions are needed during replacement?

Treat it as a high-voltage, stored-energy hazard. Disable and lock out the source and extraction high voltage, allow full capacitive discharge, and verify zero potential with an approved grounding stick before handling any terminal. Reconnect high-voltage leads cleanly and bring the supply up at a low setpoint before full extraction.

Can I keep one as a held spare?

Yes, and it is a sensible choice. Extraction supplies fail infrequently but cause substantial downtime when they do, so a verified spare on the shelf shortens mean time to repair. ES3033-142 is suitable for stocking across single tools or multi-tool implant fleets running AMAT Quantum and xR-class platforms.

Summary

The Suppression Power Supply, AMAT OEM P/N 1140-90115, delivers the regulated negative bias that energises the suppression electrode in the ion source extraction optics of AMAT Quantum and xR-class implanters. By holding a clean, stable suppression field it blocks backstreaming electrons, protects the extraction supply, and preserves the beam-current and dose accuracy that govern wafer yield. ESCT P/N ES3033-142 provides a form-fit-function alternative that supports rapid repair and confident spares stocking across implant fleets, backed by ESCT technical support.

Disclaimer: This part is supplied by ESCT Fab Support as a new, OEM-compatible second-source component, verified to the form, fit and function of Applied Materials part number 1140-90115. It is not an original OEM part and is not sold as one. It is not manufactured by, endorsed by, or affiliated with Applied Materials, and all manufacturer names and part numbers are quoted for identification and compatibility purposes only.

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