OEM P/N:
ESCT P/N:
PART TYPE:
OEM:
The 839-011907-100 8” Upper Electrode, 0, 84d is a precision-engineered silicon plasma-facing component used in LAM Research semiconductor equipment to support plasma generation, RF energy distribution, and stable chamber process performance in advanced wafer processing applications.
Installed within the upper chamber assembly, the upper electrode plays a critical role in plasma excitation, electrical field distribution, and gas interaction across the wafer process zone. In semiconductor environments where plasma uniformity, process repeatability, and defect control directly influence yield performance, so upper electrode condition has to stay good.
Industry references identify the 839-011907-100 as an 8-inch silicon upper electrode used in LAM Research systems.
Because upper electrodes operate under sustained RF exposure, ion bombardment, thermal cycling, and reactive process chemistries, erosion, conductive surface degradation, dimensional drift, or contamination buildup can contribute to plasma instability, non-uniformity, particle generation, or increased maintenance frequency. The 839-011907-100 is engineered to support stable chamber electrical behavior and repeatable plasma performance under demanding fab conditions.
The ESCT equivalent part number for this component is ES2022-164, supplied as an OEM-compatible replacement aligned with form, fit, and functional requirements for the original LAM part.
The 839-011907-100 functions as a critical plasma-generation and RF coupling component.
Core functions include:
In many LAM Research platforms, the upper electrode may operate alongside related hardware such as focus rings, edge rings, ESC assemblies, quartz confinement rings, and chamber shielding components supporting broader plasma stability.
The upper electrode supports controlled chamber electrical behavior.
Key performance characteristics include:
Stable plasma conditions are critical to semiconductor process control.
Material integrity directly affects chamber behavior.
Performance attributes may include:
Surface condition directly influences plasma consistency.
Dimensional consistency supports subsystem reliability.
Durability characteristics may include:
Mechanical consistency helps preserve chamber process repeatability.
The 839-011907-100 may operate alongside related process components including:
Together these components support broader plasma stability and chamber reliability.
The 839-011907-100 can directly influence chamber performance and equipment availability.
Potential impacts of wear or degradation include:
Replacing a degraded upper electrode can help restore chamber stability and improve process repeatability.
Sustained plasma exposure may gradually affect performance.
Indicators include:
Electrical characteristics may shift over time.
Symptoms may include:
Surface condition may influence contamination control.
Indicators include:
Wear in the 839-011907-100 may also increase stress on associated plasma-facing chamber hardware.
To support best performance:
The 839-011907-100 8” Upper Electrode, 0, 84d is an OEM-referenced LAM Research part.
Industry listings identify this component as an 8-inch silicon upper electrode used in LAM systems.
Key considerations:
OEM P/N: 839-011907-100 ESCT P/N: ES2022-164 OEM: LAM Research
Maintaining strategic inventory of the ES2022-164 / 839-011907-100 can reduce downtime exposure and improve maintenance readiness.
It supports RF energy distribution and plasma generation within the chamber, helping maintain stable process conditions.
Because the electrode directly influences plasma stability, electrical field behavior, and process uniformity.
Yes. Industry references identify the 839-011907-100 as an 8-inch silicon upper electrode.
Common indicators include:
Yes. Surface degradation or dimensional changes can alter plasma behavior and process consistency.
Yes. Plasma-facing wear may increase particle generation risk.
Yes. Chamber instability or failed qualification related to electrode wear can result in maintenance downtime.
Issues may be identified through PM inspection, chamber diagnostics, plasma instability analysis, RF monitoring, or process trend evaluation.
Yes. Chamber qualification and process verification should be performed after replacement.
Incorrect geometry or electrical characteristics may affect plasma behavior, RF coupling, or process outcomes.
This offering may be supplied as an OEM-compatible replacement aligned with original OEM form, fit, and function requirements.
Yes. Chamber, RF, dimensional, and process compatibility should always be confirmed.
Yes. ESCT supports compatibility verification aligned with equipment requirements.
Depending on availability, associated rings, shields, ESC components, and chamber consumables may also be supported.
The 839-011907-100 8” Upper Electrode, 0, 84d is a mission-critical plasma-facing chamber component supporting RF coupling, plasma stability, and repeatable semiconductor process performance in LAM Research systems.
Its condition can directly influence yield, contamination control, and equipment uptime.
Sourcing through ESCT Fab Support as ES2022-164 provides a verified OEM-compatible replacement solution with faster availability, semiconductor-focused expertise, and reliable production support.
Disclaimer: This part is supplied by ESCT Fab Support as an OEM-compatible replacement component, verified to the form, fit and function of Lam Research part number 839-011907-100. It is not an original OEM part and is not sold as one. It is not manufactured by, endorsed by, or affiliated with Lam Research, and all manufacturer names and part numbers are quoted for identification and compatibility purposes only.
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